Technology & Engineering for Thin Film Applications

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HiPIMS your System 


The new 

HiPIMS-Technology

hiP-V HiPIMS-PS

HiPIMS Power Solutions 

 

 NEW       (article published in linkedin)

 

hiPlus-Technology for HiPIMS thin-film depositioning

a step into the right direction.

 No question, HiPIMS is state of art magnetron sputtering, especially when it comes down to demanding coatings and high quality films. But still, the main restriction for HiPIMS is the low deposition rate. To overcome this, several attempts have been made, more or less successful.

A new approach is adding an active reverse voltage pulse at the end of each HiPIMS impulse. This has been observed by independently operating groups. The most promising and cost effective pulse technology to boost up the HiPIMS performance is the hiPlus technology, implemented in the hiP-V HiPIMS power supplies. Applying the “just right pulse” the hiPlus technology has shown obvious advantages. It does not only increase deposition rates, it also shows significant improvements in film hardness and film structures. 

 Technical literature, articles and papers will be released in short. For more details please contact us.

HiPIMS

High Power Impulse Magnetron Sputtering

or

HPPMS

High Power Pulsed Magnetron Sputtering

 The new HiPIMS-PS Technology, created as a co-production by an experienced team of scientists, researchers, technologists, metallurgists, process engineers and last but not least, a highly skilled power supply manufacturer.

>>>Ready for the Industry!<<<

>>>Optimized for R&D!<<<


The highly flexible HiPIMS PS:

  • 1, 6, 10, 20 KW Base units
  • Voltage, Current, Power regulation
  • Ultra fast ARC-Handling (V or I detect, absolute values or delta values (%))
  •  Voltage reversal after ARC, immediatly quenches the ARC                                               I / V reg. is adjustable  ->Voltage regulation is faster, can be disabled                                                                for certain applications
  • Pulsing frequencies up to 40KHz for low power units (1KHz / 2 KHz is standart),
  • Pulse durations from µs up to ms range;  standart pulse is from 5µs to 1ms but can be extended to 5ms, 10ms …
  • PS units can be put in series or parallel ->  increase Voltage / Power / Current


True ALL in  ONE  HiPIMS-PS for many applications

  • HiPIMS-PS,  Uni-Polar / Bi-Polar / Single-Dual Magnetro  ( or any other plasma source, ion / beam …..)
  • DC-PS; magnetron sputtering, PECVD,  Etch  
  • DC-pulse-PS; magnetron sputtering, PECVD,  Etch
  • DC-Bias-PS;
  • DC-pulse Bias-PS;
  • HiPIMS-Bias-PS – DC;
  • HiPIMS Bias DC-pulse Uni-Polar / Bi-Polar
  • Superimposed and Sequential operation -> HiPIMS + DC (DC-Pulse possible)
  • hiPlus-Option (Positive Voltage Reversal) 


The All in One hiP-V HiPIMS-PS: 

minimize hardware - maximize technology


HiPIMS Product Overview



Also available:  The HiPIMS power pack. The modular HiPIMS- PS systems!

<< HiPIMS-PS up to 80KW >>

<< more power, customized solutions upon request >>

Please Note:

The the hiP-V product lines are exclusively manufactured with components already qualified and used for the aeronautics industry and railway systems such as trains, trams and subways. These components comply with the highest quality and safety standards for the use in public transportation systems. This gears up the hiP-V products to a maximum on quality, reliability and durability.

hiP-V  Made by VIESCA 


<<for more detailed information request, please click here>>